Laboratory equipment for semiconductor quantum optics


Fabrication Facilities

  • Molecular-beam epitaxy system

    Type: Material growth equipment

    Function: The system can grow atomically flat thin film and nano-structures of semiconductors in ultra-high vacuum environment.

  • Electron-beam lithography system

    Type: Material fabrication equipment

    Function: The system can draw designed shapes on a surface covered with resist. The pattern of resist that can subsequently be transferred to the substrate material by etching.

Optics Labs

Cryostats

  • Montana system

    Type: Characterization setup

    Function: The setup can provide a stable measurement environment from 3.2K to 350K with low thermal fluctuations and nanometer level vibrations.

  • attoDRY800 system

    Type: Characterization setup

    Function: The system can provide a stable measurement environment from 3.8K to 320K and the magnetic field on sample to 9T.

  • attoCube800 system

    Type: Characterization setup


    Function: A mobile cryostation with an integrated optical breadboard. Can cool down to 3.8K.

Lasers

  • M Squared laser system

    Type: Laser

    Function: The system can produce continuous-wave, ultra-narrow linewidth laser from 725nm to 975nm.

  • Coherent laser system (Mira + OPO-X)

    (copy 2)

    Type: Laser

     

    Function: This modelocked laser system can generate ~2ps pulses over a wide wavelength range from 1000-1600nm at 76MHz. It can be frequency-locked to an external 76MHz reference.

  • Hübner CWave laser

    Type: Laser

     

    Function: Using SHG and parametric downconversion, this CW laser system covers a large wavelength range from ~500 to ~3300nm.

Characterization equipment

  • White light image setup

    Type: Characterization setup

    Function: The setup can take white light images of small structures with the resolution of several micrometers.

     

  • Michelson interferometer

    Type: Characterization setup

    Function: The setup can measure the coherent time of the incident light, operating at the wavelength around 780nm.

  • Single spectrometer

    Type: Characterization setup

    Function: The setup can take spectrums of the incident light.

  • Indistinguishability setup

    Type: Characterization setup

    Function: The setup can measure the indistinguishability of the incident light with the wavelength around 780nm.

  • Double spectrometer

    Type: Characterization setup

    Function: The setup can take spectrums of the incident light and has a higher resolution compared with the single spectrometer.

  • Telecom-wavelength spectrometer

    [Translate to English:] Type: Characterization setup

    Function: The setup can take spectrums of the incident light at telecom-wavelength with high efficiency.